Impact of the thickness of Nickel oxide film for nitrogen dioxide gas sensing Applications

Abstract = 589 times | PDF = 447 times

Main Article Content

Sabah J. Mezher Ehssan S. Hassan Marwa Abdul Muhsien Hassan Firas S. A. Ameer


Nickel oxide (NiO) thin films were formed by RF reactive magnetron sputtering onto glass substrates. The Argon and Oxygen partial pressure were (3.2×10-3 torr) and (2.12×10-2 torr) respectively at room temperature. The thickness of the films deposited was in the range of 50-150 nm. The thickness necessity structural, electrical and sensing properties of (NiO) films were methodically examined. X-ray diffraction method which shows polycrystalline landscape with preferred reflection peak at (200) plane. Scanning electron microscope analysis revealed that the growth of nanorods in all the films. The gas sensitivity of nitrogen dioxide gas was (67 %). It was observed that the gas sensitivity for (NiO) films was increased as film thickness increases.


magnetron sputtering, Nickel oxide, Nitrogen dioxide, Dynamic resistance, Sensitivity.


Download data is not yet available.

Article Details


[1] E. Fujii, A. Tomozawa, H. torii and Takayama “Thickness Influence On The Synthesis Of Metal Oxide NiO Using RF- Magnetron Sputtering “ japan. j. appl. 35, 328-330, (1996).
[2] K. Youshmura, T. Miki, S. Tanemura “ nickel oxide electrochromic thin films prepared by reactive DC magnetron Sputtering” jap.j.Appl.phys.34, 2440- 2446, (1995).
[3] M. Kitao, K. Izawa, K. Urabe, T. Komatso, S. Knwano and S. Yamada “Electro chromic properties of sputtered nickel‐oxide films “Jap. Appl. phy.33, 6656-6662, (1994).
[4] R. Tsu, L. Esaki, R, Ludeke,” road to quantum boxes” physic. Rev. 23 -763, (1996).
[5] Praveen K. Sekhar, Eric L. Brosha, Rangachary Mukundan, and Fernando H. Garzon” Chemical Sensors for Environmental Monitoring and Homeland Security” The Electrochemical Society Interface, Winter 2010.
[6] P. pramank, S. Bhattachraga,” A Chemical Method for the Deposition of Nickel Oxide Thin Films “ J. Electrochemecal.soc.137, 3869, (1990).
[7] L. D. Kadam, C .H. Bhosal, P. S. Patil,” Versatility of Chemical Spray Pyrolysis Technique” Tr.j.phy.21, 1037, (1997).
[8] Larry L. Hench and Jon K. West “The sol-gel process“ Chem. Rev., , 90 (1), pp. 33–72, (1990).
[9] Mario birkhols “ thin film analysis by X-ray scattering “, willey, Vhc. (2006).
[10] H. W. Ryu, G. P. Choi, W. S. Lee and s. park j. “Effects of Substrate Temperature and Oxygen Pressure on Crystallographic Orientations of Sputtered Nickel Oxide Films” mater sci.lett.39, 4375-4377, (2004).
[11] B. D. Cuttity and S. R. stock, “Element of X-ray diffraction
, 3rd Ed. (2001).
[12] Q. Simon, D. Barreca, A. Gasparotto, C. Maccato, E. Tondello, C. Sada, E. Comini, G. Sberveglieri, M. Banerjee, K. Xu, A. Devi, R. A. Fischer “CuO/ZnO nanocomposite gas sensors developed by a plasma-assisted route” Phys.Chem 13, 2342, (2012).
[13] N. Lee, Sh. Kim, Kakani, “Effect of film thickness on the structural morphological and optical properties of nanocrystalline ZnO films formed by RF magnetron sputtering “ thin solid films. 494- 519, (2010).
[14] A. J. Varkey and A. F. Fort “Solution growth technique for Deposition of nickel Oxide thin films, Thin Solid Films” vol. 235, 47-50, 1993.
[15] J. S. E. M. Svensson and C. G. Granqvist “Electrochromic Hydrated nickel oxide Coatings for energy efficient windows: Optical properties and coloration The mechanism” Applied Physics Letters, vol. 49, no. 23, 1566, (2003).
[16] S. Yamada, T. Yoshioka, M. Miyashita, K. Urabe, andM. Kitao” Electrochromic Properties of sputtered nickel oxide films” Journal of Applied Physics, vol. 63, No, 6, 2116–2119, (1988).
[17] M. boscarino, Ferroni, D. comini, E. gnani, V. guidi, V. martielli, G. nellii, P. rigato, V. sberveglieri, G,: “Selective sublimation processing of a molybdenum–tungsten mixed oxide thin film” 58. 289, (1999).
[19] A. Iida and R. Nishikawa, “A thin film of a Ni-NiO heterogen- Eoussystem for an optical recording medium” Japanese Journal of Applied Physics, vol. 33, 3952– 3959, (2006).
[20] E. Fujii, A. Tomozawa, H. Torii and R. “Takayama” Effects of Substrate Temperature and Oxygen Pressure on Crystallographic Orientations of Sputtered Nickel Oxide Films” Jpn. J. Appl. Phys.35, 328–330, (1996).
[21] J. Huang and Q. Wan “Gas Sensors Based on Semiconducting Metal Oxide One-Dimensional Nanostructures” Sensors (Basel), 9(12), 9903–9924, 2009.
[23] D. Delia Puzzovio “ Surface Interaction Mechanisms in Metal-Oxide Semiconductors for Alkane Detection “ A Thesis in Universita Degli Studi Di Ferrara, 2008.
[24] A. R. Balu, V.S. Nagarethinam ,” Nanocrystalline NiO Thin Films Prepared by a Low-Cost Simplified Spray Technique Using Perfume Atomizer”” Journal of Electron Devices, Vol. 13, pp. 920-930, (2012).
[25] Arwaa Fadil, “Structural and Morphological Studies of NiO Thin Films Prepared by Rapid Thermal Oxidation Method” IJAIEM , volume 2, Issue 1, Jan.(2013).
[26] H. Long Chen, Y. Ming Lu and W. Sing Hwang, Materials Transactions, Vol. 46, No. 4 - pp. 872 to 879, (2005).
[27] M. Batzill and U. Diebold,"The Surface and Materials Science of Tin Oxide", Progress in Surface Science, Vol. 79, PP. 47–154, (2005).
[28] G. D. Ca˜nizares “Nanostructured Nickel Oxide Thin Films Grown by Reactive RF Magnetron Sputtering Thesis UNIVERSIDAD AUTONOMA DE MADRID May 2014.
[29] N. Barsan and U. Weimar ” Fundamentals of Metal Oxide Gas Sensors” IMCS– The 14th International Meeting on Chemical Sensors (2012).
[30] A. Muhammad, R, Mahfujur, J. M. Don, Coburn, Nadia, D, Danilo, V. Johannes G., Dowling, Denis P. “Deposition and Characterization of NiOx Coatings by Magnetron Sputtering for Application in Dye-Sensitized Solar Surface and Coatings Technology“204 (16-17): 2729-2739. 2011.
[31] M. Tachikawa and M. Yamaguchi, Film thickness dependence of dislocation density reduction in GaAs-on-Si substrates, Appl. Phys. Lett. 56, 484 (1990).
[32] B. Subramanian, M. Mohamed Ibrahim, V. Senthilkumar, K. Murali, V.S. Vidhya, C. Sanjeeviraja, M. Jayachandran “Optoelectronic and electrochemical properties of nickel oxide (NiO) films deposited by DC reactive magnetron sputtering” Physica, 403 – 4104-4110, (2008)
[33] J. Bachmann, A. Zolotaryov, O. Albrecht, S. Goetze, A. Berger, D. Hesse, D. Novikov and K. Nielsch. “The stoichiometry of nickel oxide _lms prepared by ALD. Chemical Vapor Deposition” 17(7-9):177180, 2011
[34] Y. Ashok Kumar, A. Sivasankar and P. Sreedhara “Influence of oxygen partial pressure on the structural, optical and electrical properties of Cu-doped NiO thin films” Phys. Scr. 87 - 015801 (5pp), (2013) .
[35] B. Shweta, A. Acharya ," Effect of copper doping on the change in the optical absorption behavior in NiO thin films", journal of Renewable Energy,46,43-48,(2012)
[36] S.C. Chen a, T.Y. Kuo b, Y.C. Lin a, S.W. Hsu a, H.C. Lin b” Effect of Palladium Content on Microstructures, Electrical and Optical Properties of NiO Films by RF Sputtering” JASCOThin Solid Films 549 - 50–53, (2013).
[37] F. S. Hashim, K. H. Mohsin, “Effect of Li Doping on Structure and Optical Energy Gap of NiO Films Prepared by Sol–Gel Technique” JOURNAL OF KUFA – PHYSICS Vol.7/ No.1 (2015).